Lens cleaning module for immersion lithography apparatus

Details Lens cleaning module for immersion lithography apparatus Lens cleaning module for immersion lithography apparatus

2005-09-07

2011-11-08

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

Reexamination Certificate

active

08054444

ABSTRACT:
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is provided. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.

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