LDMOS with guard ring (of same type as drain) surrounding...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S336000, C257S344000, C257S408000

Reexamination Certificate

active

06933559

ABSTRACT:
In high-voltage devices comprising a lightly doped region (3) provided with a heavily doped contact zone4, damage caused by local breakdown at the corner of the contact zone may occur as a result of the Kirk effect at a high current density. To improve the robustness of the device, an annular protection zone (14) of the same conductivity type is provided so as to surround the contact zone at a small distance. As a result, breakdown will occur initially at the corner of the protection zone. However, due to the resistance between the protection zone and the contact zone, a more uniform current distribution is obtained, which prevents damage caused by local current concentration.

REFERENCES:
patent: 3538398 (1970-11-01), Whiting
patent: 5146298 (1992-09-01), Eklund
patent: 5578859 (1996-11-01), Wondrak et al.
patent: 5629558 (1997-05-01), Galbiati et al.
patent: 5940700 (1999-08-01), Galbiati et al.
patent: 6211551 (2001-04-01), Suzumura et al.
patent: 0514060 (1992-11-01), None
patent: 10321842 (1998-12-01), None
patent: WO 8300776 (1983-03-01), None
patent: 8503807 (1985-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

LDMOS with guard ring (of same type as drain) surrounding... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with LDMOS with guard ring (of same type as drain) surrounding..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and LDMOS with guard ring (of same type as drain) surrounding... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3468587

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.