LDMOS transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S335000, C257S337000, C257S339000, C257S341000, C257S342000, C257S492000, C257S493000

Reexamination Certificate

active

06911696

ABSTRACT:
A lateral double-diffused MOS transistor (LDMOS) has a body zone and additional body regions assigned to the body zone, thereby producing a “deep body.” The deep body results in a quasi one-dimensional course of the potential lines, with the result that the dielectric strength is increased. The self-alignment between gate and channel is preserved, and parameter fluctuations are reduced.

REFERENCES:
patent: 5156989 (1992-10-01), Williams et al.
patent: 5237193 (1993-08-01), Williams et al.
patent: 5374843 (1994-12-01), Williams et al.
patent: 5430316 (1995-07-01), Contiero et al.
patent: 6288424 (2001-09-01), Ludikhuize
patent: 6462378 (2002-10-01), Kim
patent: 6593621 (2003-07-01), Tsuchiko et al.
patent: 2002/0060341 (2002-05-01), Terashima
B. Jayant Baliga: “Modern Power Devices”,Krieger Publishing Company, Malabar, Florida, 1987, pp. 81, 83 and 88.
Taylor Efland: “Lateral DMOS Structure Development for Advanced Power Technologies”,TI Technical Journal, Mar./Apr. 1994, pp. 10-24.
S. Merchant et al.: “High-Performance 13-65 V Rated LDMOS Transistors in an Advanced Smart Power Technology”,IEEE, 1999, pp. 225-227.

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