Layout method, CAD apparatus, computer-readable program and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07810051

ABSTRACT:
A layout method for a layout design of a circuit includes a simulation step carrying out a simulation of the circuit, a specifying step specifying a maximum current value to flow between terminals of each of elements of the circuit and specifying a shape of each of the elements, and a layout composing step automatically creating and completing a layout of the elements so as to satisfy an electro migration rule, based on the specified maximum current value and shape of each of the elements.

REFERENCES:
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patent: 6756242 (2004-06-01), Regan
patent: 7007258 (2006-02-01), Li
patent: 7039881 (2006-05-01), Regan
patent: 7254801 (2007-08-01), Borer et al.
patent: 2006/0206847 (2006-09-01), Ogawa
patent: 4-242959 (1992-08-01), None
patent: 7-160754 (1995-06-01), None
patent: 2000-349158 (2000-12-01), None
patent: 2002-151592 (2002-05-01), None
“Japanese Office Action”, mailed by JPO and corresponding to Japanese application No. 2006-004117 on Feb. 23, 2010, with partial English translation.
“Japanese Office Action”, mailed by JPO and corresponding to Japanese application No. 2006-004117 on Jul. 20, 2010, with partial English translation.

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