Layered devices having surface curvature and method of construct

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156625, 156645, 1566591, 156662, 156663, 5116572, 51283R, 51310, 51326, 430314, 430321, 430323, 430324, 427162, 427165, 427167, 350607, 350629, B05D 506, G02B 510, B44C 122

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048850551

ABSTRACT:
A method of treating a substrate having first and second sides with corresponding oppositely facing first and second surfaces, to produce curvature in the first surface. The method includes the steps of removing material, according to a predetermined pattern, from the second side of the substrate, and applying a stress-producing film of material to at least one surface of the substrate to thereby cause the substrate to bend to produce the desired curvature in the first surface.

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patent: 4298247 (1981-11-01), Michelet et al.
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patent: 4426440 (1984-01-01), Thompson
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patent: 4684565 (1987-08-01), Abeles et al.
patent: 4714668 (1987-12-01), Uneno et al.
patent: 4724043 (1988-02-01), Bergendahl et al.
"Curved Silicon Substrates for Multilayered Structure", SPIE vol. 691, X-ray Imaging II (1986) by Woodbury et al.

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