Layer forming method, product comprising the layer, optical...

Details Layer forming method, product comprising the layer, optical... Layer forming method, product comprising the layer, optical...

2005-03-25

2008-12-09

Chen, Bret (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S576000, C427S553000, C427S427000

Reexamination Certificate

active

07462379

ABSTRACT:
A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.

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