Layer deposition methods

Details Layer deposition methods Layer deposition methods

2004-05-27

2011-10-18

Cleveland, Michael (Department: 1712)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

Reexamination Certificate

active

08039054

ABSTRACT:
A layer deposition method includes: feeding a reactant with a first flow of an inert gas as a carrier gas into a reaction chamber to chemisorb the reactant on a substrate; feeding the first flow of the inert gas to purge the reaction chamber and a first reactant feed line; and feeding the second flow of the inert gas into the reaction chamber through a feed line different from the first reactant feed line.

REFERENCES:
patent: 6323129 (2001-11-01), Moutinho
patent: 6576053 (2003-06-01), Kim et al.
patent: 7160817 (2007-01-01), Marsh
patent: 2004/0062081 (2004-04-01), Drewes
patent: 2004/0115898 (2004-06-01), Moghadam et al.
patent: 2004/0216665 (2004-11-01), Soininen et al.
patent: 10-2000-0051044 (2000-08-01), None

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