Layer arrangement, memory cell, memory cell arrangement and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S303000, C438S206000

Reexamination Certificate

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06900495

ABSTRACT:
The invention relates to a layer arrangement, a memory cell, a memory cell arrangement and a method for producing a layer arrangement. The layer arrangement has a monocrystalline substrate, a highly doped region in the substrate and a metallically conductive structure in the highly doped region, a partial region of the highly doped region that is arranged in a surface region of the substrate being monocrystalline.

REFERENCES:
patent: 4877755 (1989-10-01), Rodder
patent: 4910576 (1990-03-01), Campbell et al.
patent: 5067002 (1991-11-01), Zdebel et al.
patent: 5747371 (1998-05-01), Robb et al.
patent: 6255684 (2001-07-01), Roesner et al.
patent: 6541810 (2003-04-01), Divakaruni et al.
patent: 195 19 160 (1996-09-01), None
Schuppen, A., Vescan, L., Jebasinski, R., v.d. Hart, A., Luth, H. Effect of doping profiles on Si/CoSi2permeable base transistors. Microeletronic Engineering 18, pp. 259-266 (1992).
Risch, L. Rosner, W., Schulz, T., Transistor Verkehrt. In Spektrum der Wissenschaft, Edition Jun. 1999, p. 941.

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