Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2008-03-26
2010-06-15
Wojciechowicz, Edward (Department: 2895)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S182000, C438S691000, C438S701000, C438S713000, C438S754000
Reexamination Certificate
active
07736956
ABSTRACT:
Embodiments of the invention provide a device with a metal gate, a high-k gate dielectric layer, source/drain extensions a distance beneath the metal gate, and lateral undercuts in the sides of the metal gate.
REFERENCES:
patent: 3387820 (1968-06-01), Sanderfer et al.
patent: 4231149 (1980-11-01), Chapman et al.
patent: 4487652 (1984-12-01), Almgren
patent: 4711701 (1987-12-01), McLevige
patent: 4818715 (1989-04-01), Chao
patent: 4905063 (1990-02-01), Beltram et al.
patent: 4906589 (1990-03-01), Chao
patent: 4907048 (1990-03-01), Huang
patent: 4994873 (1991-02-01), Madan
patent: 4996574 (1991-02-01), Shirasaki et al.
patent: 5023203 (1991-06-01), Choi
patent: 5120666 (1992-06-01), Gotou
patent: 5124777 (1992-06-01), Lee et al.
patent: 5179037 (1993-01-01), Seabaugh
patent: 5216271 (1993-06-01), Takagi et al.
patent: 5218213 (1993-06-01), Gaul et al.
patent: 5278012 (1994-01-01), Yamanaka et al.
patent: 5308999 (1994-05-01), Gotou
patent: 5328810 (1994-07-01), Lowrey et al.
patent: 5338959 (1994-08-01), Kim et al.
patent: 5346836 (1994-09-01), Manning et al.
patent: 5346839 (1994-09-01), Sundaresan
patent: 5357119 (1994-10-01), Wang et al.
patent: 5391506 (1995-02-01), Tada et al.
patent: 5466621 (1995-11-01), Hisamoto et al.
patent: 5475869 (1995-12-01), Gomi et al.
patent: 5479033 (1995-12-01), Baca et al.
patent: 5482877 (1996-01-01), Rhee
patent: 5514885 (1996-05-01), Myrick
patent: 5521859 (1996-05-01), Ema et al.
patent: 5539229 (1996-07-01), Noble, Jr. et al.
patent: 5543351 (1996-08-01), Hirai et al.
patent: 5545586 (1996-08-01), Koh
patent: 5563077 (1996-10-01), Ha et al.
patent: 5576227 (1996-11-01), Hsu
patent: 5578513 (1996-11-01), Maegawa
patent: 5595919 (1997-01-01), Pan
patent: 5652454 (1997-07-01), Iwamatsu et al.
patent: 5658806 (1997-08-01), Lin et al.
patent: 5665203 (1997-09-01), Lee et al.
patent: 5682048 (1997-10-01), Shinohara et al.
patent: 5698869 (1997-12-01), Yoshimi et al.
patent: 5701016 (1997-12-01), Burroughs et al.
patent: 5716879 (1998-02-01), Choi et al.
patent: 5739544 (1998-04-01), Yuki et al.
patent: 5760442 (1998-06-01), Shigyo et al.
patent: 5770513 (1998-06-01), Okaniwa
patent: 5773331 (1998-06-01), Solomon et al.
patent: 5776821 (1998-07-01), Haskell et al.
patent: 5793088 (1998-08-01), Choi et al.
patent: 5804848 (1998-09-01), Mukai
patent: 5811324 (1998-09-01), Yang
patent: 5814895 (1998-09-01), Hirayama
patent: 5821629 (1998-10-01), Wen et al.
patent: 5827769 (1998-10-01), Aminzadeh et al.
patent: 5844278 (1998-12-01), Mizuno et al.
patent: 5856225 (1999-01-01), Lee et al.
patent: 5880015 (1999-03-01), Hata
patent: 5888309 (1999-03-01), Yu
patent: 5889304 (1999-03-01), Watanabe et al.
patent: 5899710 (1999-05-01), Mukai
patent: 5905285 (1999-05-01), Gardner et al.
patent: 5908313 (1999-06-01), Chau et al.
patent: 5952701 (1999-09-01), Bulucea et al.
patent: 5965914 (1999-10-01), Miyamoto
patent: 5976767 (1999-11-01), Li
patent: 5985726 (1999-11-01), Yu et al.
patent: 6013926 (2000-01-01), Oku et al.
patent: 6018176 (2000-01-01), Lim
patent: 6031249 (2000-02-01), Yamazaki et al.
patent: 6051452 (2000-04-01), Shigyo et al.
patent: 6054355 (2000-04-01), Inumiya et al.
patent: 6063675 (2000-05-01), Rodder
patent: 6066869 (2000-05-01), Noble et al.
patent: 6087208 (2000-07-01), Krivokapic et al.
patent: 6093621 (2000-07-01), Tseng
patent: 6114201 (2000-09-01), Wu
patent: 6114206 (2000-09-01), Yu
patent: 6117741 (2000-09-01), Chatterjee et al.
patent: 6120846 (2000-09-01), Hintermaier et al.
patent: 6130123 (2000-10-01), Liang et al.
patent: 6144072 (2000-11-01), Iwamatsu et al.
patent: 6150222 (2000-11-01), Gardner et al.
patent: 6153485 (2000-11-01), Pey et al.
patent: 6159808 (2000-12-01), Chuang
patent: 6163053 (2000-12-01), Kawashima
patent: 6165880 (2000-12-01), Yaung et al.
patent: 6174820 (2001-01-01), Habermehl et al.
patent: 6190975 (2001-02-01), Kubo et al.
patent: 6200865 (2001-03-01), Gardner et al.
patent: 6218309 (2001-04-01), Miller et al.
patent: 6251729 (2001-06-01), Montree et al.
patent: 6251751 (2001-06-01), Chu et al.
patent: 6251763 (2001-06-01), Inumiya et al.
patent: 6252284 (2001-06-01), Muller et al.
patent: 6259135 (2001-07-01), Hsu et al.
patent: 6261921 (2001-07-01), Yen et al.
patent: 6262456 (2001-07-01), Yu et al.
patent: 6274503 (2001-08-01), Hsieh
patent: 6287924 (2001-09-01), Chau et al.
patent: 6294416 (2001-09-01), Wu
patent: 6307235 (2001-10-01), Forbes et al.
patent: 6310367 (2001-10-01), Yagishita et al.
patent: 6317444 (2001-11-01), Chakrabarti et al.
patent: 6319807 (2001-11-01), Yeh et al.
patent: 6335251 (2002-01-01), Miyano et al.
patent: 6358800 (2002-03-01), Tseng
patent: 6359311 (2002-03-01), Colinge et al.
patent: 6362111 (2002-03-01), Laaksonen et al.
patent: 6368923 (2002-04-01), Huang
patent: 6376317 (2002-04-01), Forbes et al.
patent: 6383882 (2002-05-01), Lee et al.
patent: 6387820 (2002-05-01), Sanderfer
patent: 6391782 (2002-05-01), Yu
patent: 6396108 (2002-05-01), Krivokapic et al.
patent: 6399970 (2002-06-01), Kubo et al.
patent: 6403434 (2002-06-01), Yu
patent: 6403981 (2002-06-01), Yu
patent: 6407442 (2002-06-01), Inoue et al.
patent: 6410371 (2002-06-01), Yu et al.
patent: 6413802 (2002-07-01), Hu et al.
patent: 6413877 (2002-07-01), Annapragada
patent: 6424015 (2002-07-01), Ishibashi et al.
patent: 6437550 (2002-08-01), Andoh et al.
patent: 6457890 (2002-10-01), Kohlruss et al.
patent: 6458662 (2002-10-01), Yu
patent: 6459123 (2002-10-01), Enders et al.
patent: 6462611 (2002-10-01), Hisamoto et al.
patent: 6465290 (2002-10-01), Suguro et al.
patent: 6472258 (2002-10-01), Adkisson et al.
patent: 6475869 (2002-11-01), Yu
patent: 6475890 (2002-11-01), Yu
patent: 6479866 (2002-11-01), Xiang
patent: 6483146 (2002-11-01), Lee
patent: 6483151 (2002-11-01), Wakabayashi et al.
patent: 6483156 (2002-11-01), Adkisson et al.
patent: 6495403 (2002-12-01), Skotnicki et al.
patent: 6498096 (2002-12-01), Bruce et al.
patent: 6500767 (2002-12-01), Chiou et al.
patent: 6501141 (2002-12-01), Leu
patent: 6506692 (2003-01-01), Andideh
patent: 6515339 (2003-02-01), Shin et al.
patent: 6525403 (2003-02-01), Inaba et al.
patent: 6526996 (2003-03-01), Chang et al.
patent: 6534807 (2003-03-01), Mandelman et al.
patent: 6537862 (2003-03-01), Song
patent: 6537885 (2003-03-01), Kang et al.
patent: 6537901 (2003-03-01), Cha et al.
patent: 6541829 (2003-04-01), Nishinohara et al.
patent: 6555879 (2003-04-01), Krivokapic et al.
patent: 6562665 (2003-05-01), Yu
patent: 6562687 (2003-05-01), Deleonibus
patent: 6566734 (2003-05-01), Sugihara et al.
patent: 6583469 (2003-06-01), Fried et al.
patent: 6605498 (2003-08-01), Murthy et al.
patent: 6610576 (2003-08-01), Nowak
patent: 6611029 (2003-08-01), Ahmed et al.
patent: 6630388 (2003-10-01), Sekigawa et al.
patent: 6635909 (2003-10-01), Clark et al.
patent: 6642090 (2003-11-01), Fried et al.
patent: 6642114 (2003-11-01), Nakamura
patent: 6645797 (2003-11-01), Buynoski et al.
patent: 6645826 (2003-11-01), Yamazaki et al.
patent: 6645861 (2003-11-01), Cabral et al.
patent: 6656853 (2003-12-01), Ito
patent: 6657259 (2003-12-01), Fried et al.
patent: 6660598 (2003-12-01), Hanafi et al.
patent: 6664160 (2003-12-01), Park et al.
patent: 6680240 (2004-01-01), Maszara
patent: 6686231 (2004-02-01), Ahmed et al.
patent: 6689650 (2004-02-01), Gambino et al.
patent: 6693324 (2004-02-01), Maegawa et al.
patent: 6696366 (2004-02-01), Morey et al.
patent: 6706571 (2004-03-01), Yu et al.
patent: 6709982 (2004-03-01), Buynoski et al.
patent: 6713396 (2004-03-01), Anthony
patent: 6716684 (2004-04-01), Krivokapic et al.
patent: 6716686 (2004-04-01), Buynoski et al.
patent: 6716690 (2004-04-01), Wang et al.
patent: 6730964 (2004-05-01), Horiuchi
patent: 6744103 (2004-06-01), Snyder
patent: 6756657 (2004-06-01), Zhang et al.
patent: 6762469 (2004-07-01), Mocuta et al.
patent: 6764884 (2004-07-01), Yu et al.
patent: 6770516 (2004-08-01), Wu et al.
patent: 6774390 (2004-08-01), Sugiyama et al.
patent: 6784071 (2004-08-01), Chen et al.
patent: 6784076 (2004-08-01), Gonzalez et al.
patent: 6787402 (2004-09-01), Yu
patent: 6787406 (2004-09-01), Hill et al.
patent: 6787439 (2004-09-01), Ah
Brask Justin K.
Chau Robert S.
Datta Suman
Dewey Gilbert
Doczy Mark L.
Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Wojciechowicz Edward
LandOfFree
Lateral undercut of metal gate in SOI device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lateral undercut of metal gate in SOI device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lateral undercut of metal gate in SOI device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4221833