Lateral SOI component having a reduced on resistance

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S330000, C257S335000, C257S494000, C257SE21356, C257SE21358

Reexamination Certificate

active

07554157

ABSTRACT:
An SOI semiconductor component comprises a semiconductor substrate having a basic doping, a dielectric layer arranged on the semiconductor substrate, and a semiconductor layer arranged on the dielectric layer. The semiconductor layer includes a drift zone of a first conduction type, a junction between the drift zone and a further component zone which is configured in such a way that a space charge zone is formed in the drift zone when a reverse voltage is applied to the junction, and a terminal zone adjacent to the drift zone. A first terminal electrode is connected to the further component zone, and a second terminal electrode is connected to the terminal zone. In the semiconductor substrate a first semiconductor zone is doped complementarily with respect to a basic doping of the semiconductor substrate, and the first terminal electrode is connected to the first semiconductor zone. A rectifier element is connected between the first terminal electrode and the first semiconductor zone.

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patent: 4941026 (1990-07-01), Temple
patent: 5886384 (1999-03-01), Soderbarg et al.
patent: 6693327 (2004-02-01), Priefert et al.
patent: 7202526 (2007-04-01), Kitagawa et al.
patent: 2002/0113275 (2002-08-01), Stecher et al.
patent: 43 09 764 (1997-01-01), None
patent: 101 06 359 (2002-09-01), None
patent: 0 382 165 (1990-08-01), None
patent: WO 2005/076366 (2005-08-01), None

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