Lateral semiconductor device with low on-resistance and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S341000, C257S343000, C257S409000, C257S491000, C257S492000, C257S493000, C438S270000, C438S140000, C438S454000

Reexamination Certificate

active

06906381

ABSTRACT:
A lateral semiconductor device (20) such as LDMOS, a LIGBT, a lateral diode, a lateral GTO, a lateral JFET or a lateral BJT, comprising a drift region (12) having a first surface (22) and a first conductivity type, first and second conductive (4, 8) extending into the drift region from the first surface. The lateral semiconductor device further comprises an additional region (24) or several additional regions, having a second conductivity type, between the first and second semiconductor regions (4, 8), the additional region extending into the drift region from the first surface (22), wherein the additional region forms a junction dividing the electric field between the first and second semiconductor regions when a current path is established between the first and second semiconductor regions. This allows the doping concentration of the drift region to be increased, thereby lowering the on-resistance of the device.

REFERENCES:
patent: 6097063 (2000-08-01), Fujihira
patent: 6445038 (2002-09-01), Tihanyi
patent: 6455911 (2002-09-01), Stephani et al.
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patent: WO 00/72360 A2 (2000-11-01), None
Cezac, N., et al., “A New Generation of Power Unipolar Devices: the Concept of the FLoating Islands MOS Transistor (FLIMOST),”12 International Symposium on Power Semiconductor Devices and ICS(ISPSD 2000), Toulouse, France, May 22-25, 2000, pp. 69-72.

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