Laser treatment apparatus, laser treatment method, and...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor

Reexamination Certificate

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Details

C438S149000, C438S486000, C257SE21134, C257SE21347, C257SE21475

Reexamination Certificate

active

11274272

ABSTRACT:
The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.

REFERENCES:
patent: 6849825 (2005-02-01), Tanaka
patent: 2004/0041158 (2004-03-01), Hongo et al.
patent: 09-174264 (1997-07-01), None
patent: 10-263866 (1998-10-01), None
patent: 2001-018079 (2001-01-01), None
patent: 2003-126977 (2003-05-01), None

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