Laser stimulated halogen gas etching of metal substrates

Details Laser stimulated halogen gas etching of metal substrates Laser stimulated halogen gas etching of metal substrates

1985-10-18

1986-11-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 156656, 156664, 156666, 219121LJ, 219121LM, 427 531, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

046220950

ABSTRACT:
A method of radiation induced dry etching of a metallized (e.g. copper) substrate is disclosed wherein the substrate is pattern-wise exposed to a beam of laser radiation in a halogen gas atmosphere which is reactive with the substrate to form a metal halide salt reaction product to accelerate the formation of the metal halide salt without its substantial removal from the substrate. The metal halide salt is removed from the substrate by contact of the substrate with a solvent for the metal halide salt.

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