Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2005-08-29
2008-12-02
Dang, Phuc T (Department: 2892)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S796000, C438S797000, C257S527000, C257S616000
Reexamination Certificate
active
07459406
ABSTRACT:
Objects of the present invention is to reduce a number of scanning a linear laser, to shorten the amount of time for laser annealing, and to reduce a manufacturing process, a manufacturing time, and manufacturing cost of a semiconductor device. In this invention, a gas at high temperature is locally blown so as to overlap at an irradiation surface of linear laser light. The linear laser light can be obtained by injecting laser light radiated from a laser oscillator into a lens. The gas at high temperature can be obtained by heating a gas which is compressed using a gas compressor, by a nozzle type heater. The heated has is sprayed so as to overlap with the irradiation surface of the linear laser light.
REFERENCES:
patent: 5854803 (1998-12-01), Yamazaki et al.
patent: 5932302 (1999-08-01), Yamazaki et al.
patent: 6171674 (2001-01-01), Yamazaki et al.
patent: 6183816 (2001-02-01), Yamazaki et al.
patent: 6210996 (2001-04-01), Yamazaki et al.
patent: 6242291 (2001-06-01), Kusumoto et al.
patent: 6468617 (2002-10-01), Yamazaki et al.
patent: 6468842 (2002-10-01), Yamazaki et al.
patent: 6528359 (2003-03-01), Kusumoto et al.
patent: 6706570 (2004-03-01), Yamazaki et al.
patent: 6784030 (2004-08-01), Yamazaki et al.
patent: 6835523 (2004-12-01), Yamazaki et al.
patent: 6882012 (2005-04-01), Yamazaki et al.
patent: 7196400 (2007-03-01), Yamazaki et al.
patent: 7271042 (2007-09-01), Kusumoto et al.
patent: 7351646 (2008-04-01), Kusumoto et al.
patent: 2001/0019861 (2001-09-01), Yamazaki et al.
patent: 2003/0003610 (2003-01-01), Yamazaki et al.
patent: 2003/0203518 (2003-10-01), Yamazaki et al.
patent: 2005/0023255 (2005-02-01), Yamazaki et al.
patent: 2005/0089648 (2005-04-01), Yamazaki et al.
patent: 8-30968 (1996-02-01), None
patent: 08-195357 (1996-07-01), None
patent: 10-172911 (1998-06-01), None
patent: 2001-15435 (2001-01-01), None
Tanaka Koichiro
Yamamoto Yoshiaki
Dang Phuc T
Fish & Richardson P.C.
Semiconductor Energy Laboratory Co,. Ltd.
LandOfFree
Laser processing unit, laser processing method, and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Laser processing unit, laser processing method, and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser processing unit, laser processing method, and method... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4050200