X-ray or gamma ray systems or devices – Source
Patent
1998-02-03
1999-11-23
Porta, David P.
X-ray or gamma ray systems or devices
Source
378143, H01J 3508
Patent
active
059913606
ABSTRACT:
A laser plasma X-ray source has an improved X-ray conversion efficiency and a minimized occurrence of debris, and a semiconductor lithography apparatus using the same and a method therefor are provided. An X-ray generation unit has a vacuum chamber 5 which encases the target; target supply unit 110 which supplies a fine particle mixture gas target into the vacuum chamber 5; a laser irradiation unit 120 which irradiates a laser beam 2 on the particle mixture gas target 10; and a target recovery unit 130 which recovers unused particle mixture gas target from the vacuum chamber 5.
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Matsui Tetsuya
Nishi Masatsugu
Tooma Masahiro
Ueno Manabu
Yamada Kimio
Hitachi , Ltd.
Porta David P.
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