Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2005-08-02
2005-08-02
Lee, Wilson (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111710, C372S055000, C372S058000, C372S076000
Reexamination Certificate
active
06924600
ABSTRACT:
In laser-plasma generation, a fluid of target material is jet out to form a jet tube target21having a diameter φ and a wall thickness τ with a shell and a hollow space within the shell by using a core-column. A plurality of pulse-like laser beams30are directed to the jet tube target radially and equiangularly-spaced directions and are simultaneously focused and irradiated onto the jet tube target to generate the plasma.
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L. Rymell, et al., “X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target”, SPIE vol. 3676, Part of the SPIE Conference on Emerging Lithographic Technologies III, pp. 421-424, Santa Clara, California, Mar. 1999.
Björn A. M. Hansson, “Xenon liquid-jet laser-plasma source for EUV lithography”, Proceedings of SPIE, vol. 3997, In Emerging Lithographic Technologies IV, pp. 729-732, (2000).
Al-Nazer Leith
Foley & Lardner LLP
Lee Wilson
LandOfFree
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