Laser plasma generation method and structure thereof

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

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C315S111710, C372S055000, C372S058000, C372S076000

Reexamination Certificate

active

06924600

ABSTRACT:
In laser-plasma generation, a fluid of target material is jet out to form a jet tube target21having a diameter φ and a wall thickness τ with a shell and a hollow space within the shell by using a core-column. A plurality of pulse-like laser beams30are directed to the jet tube target radially and equiangularly-spaced directions and are simultaneously focused and irradiated onto the jet tube target to generate the plasma.

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patent: 2000-509190 (2000-07-01), None
patent: WO 97/40650 (1997-10-01), None
L. Rymell, et al., “X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target”, SPIE vol. 3676, Part of the SPIE Conference on Emerging Lithographic Technologies III, pp. 421-424, Santa Clara, California, Mar. 1999.
Björn A. M. Hansson, “Xenon liquid-jet laser-plasma source for EUV lithography”, Proceedings of SPIE, vol. 3997, In Emerging Lithographic Technologies IV, pp. 729-732, (2000).

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