Laser interferometer system and method for monitoring and contro

Details Laser interferometer system and method for monitoring and contro Laser interferometer system and method for monitoring and contro

1984-04-13

1986-10-21

McGraw, Vincent P.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356355, G01B 1102, G01B 902

Patent

active

046182624

ABSTRACT:
A laser interferometer system and associated method for etching endpoint detection, and for monitoring etching or growth to a selected depth. The process implemented by the system involves scanning the laser beam across scribe lines on a wafer which is undergoing fabrication (growth or etching) and monitoring the resulting interference pattern. Alternatively, the process implemented by this system involves moving the laser beam across the scribe line to detect the position of the scribe line; locking the laser beam on the scribe line; and monitoring the resulting interference pattern.

REFERENCES:
patent: 3861804 (1975-01-01), Lehmbeck
patent: 4141780 (1979-02-01), Kleinknecht et al.
patent: 4367044 (1983-01-01), Booth et al.
patent: 4406949 (1983-09-01), Spohnheimer
patent: 4454001 (1984-06-01), Sternheim et al.

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