Laser induced flow glass materials

Details Laser induced flow glass materials Laser induced flow glass materials

1982-01-15

1984-04-17

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

219121LE, 219121LF, B05D 306

Patent

active

044434936

ABSTRACT:
In a semiconductor device, laser energy is used to selectively heat various SiO.sub.2 based materials to elevated temperatures while maintaining the active device region and electrical interconnects at relatively low temperatures, to for example, induce densification and/or flow of the SiO.sub.2 based material to round off sharp edges and stops, without damaging or affecting the active region and electrical interconnects.

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Kaplan et al., Electronics, Feb. 28, 1980, pp. 137-142.
Auston et al., Bell Lab. Record, Jul./Aug. 1979, pp. 187-191.
Huang IBM Tech. Disc. Bull, vol. 10, No. 9, Feb. 1968, pp. 1359-1360.
Saifi et al., "Ceramic Bulletin" vol. 52, No. 11 (1973), pp. 838-841.
Arecchi et al., Laser Handbook, vol. 2 (1972), North-Holland Publishing Co., NY, pp. 1577-1632.

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