Laser-induced etching of multilayer materials

Details Laser-induced etching of multilayer materials Laser-induced etching of multilayer materials

1996-08-01

1999-02-23

McCamish, Marion

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 72, 216 75, 216 74, C23F 100

Patent

active

058740112

ABSTRACT:
Techniques and apparatus for the laser induced etching of a reactive material, or of a multilayer substrate or wafer comprising layers of materials of different etching characteristics and reactivities, are disclosed. Short wavelength laser radiation and control of the process ambient equalize etch rates of the layers of a multilayer substrate or wafer and allow high-resolution etching. A suppressant gas introduced into a halogen-containing ambient suppresses explosive reactions between the ambient and reactive materials or layers. For less reactive layers or materials, reduced-pressure air is a suitable ambient. The techniques and apparatus disclosed herein are particularly useful in the manufacture of magnetic data transfer heads.

REFERENCES:
patent: 3364087 (1968-01-01), Solomon et al.
patent: 4260649 (1981-04-01), Dension et al.
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4359485 (1982-11-01), Donnelly et al.
patent: 4622095 (1986-11-01), Grobman et al.
patent: 4751779 (1988-06-01), Nagatomo et al.
patent: 4752668 (1988-06-01), Rosenfield et al.
patent: 4948460 (1990-08-01), Sandaiji et al.
patent: 5310624 (1994-05-01), Ehrlich
patent: 5389196 (1995-02-01), Bloomstein et al.
Roger Wood, "Magnetic megabits", IEEE Spectrum, May 1990, pp. 32-33 and 36-38.
Hackh's Chemical Dictionary, definition for "permalloy," p. 502, 1969.

Affiliated with

Also associated with

Rating

Laser-induced etching of multilayer materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser-induced etching of multilayer materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser-induced etching of multilayer materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-303407