Laser etching of semiconductors

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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1566431, H01L 21306

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active

054862647

ABSTRACT:
A laser-based technique for rapid etching of a semi-insulating substrate is described wherein a vertically suspended semiconductive sample is placed in an etchant solution. An intermittent laser beam is applied thereto whereby gas bubbles formed during the application of the laser beam to the laser reaction zone are displaced during the dark period of the intermittent laser beam.

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