Laser CVD device and laser CVD method

Details Laser CVD device and laser CVD method Laser CVD device and laser CVD method

2007-01-23

2007-01-23

Bueker, Richard (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230MP, C118S725000, C118S729000, C156S345350, C156S345380

Reexamination Certificate

active

10600075

ABSTRACT:
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating gas into a plasma state by arc discharge and for supplying the plasma sate gas to the film formation face; and a film forming unit having means for sealing film forming gas while being isolated from an external atmosphere, means for radiating a laser beam to the film forming gas, wherein the film is formed over the film formation face of the substrate.

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Taiwan Office Action dated Feb. 15, 2005, together with an English Translation.

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