Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1989-02-14
1990-01-16
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
134 1, 156644, 156651, 156655, 156668, 156345, 20419236, 21912169, 21912185, B44C 122, B29C 3700, C03C 1500, C03C 2506
Patent
active
048941158
ABSTRACT:
The surface of a polymer dielectric layer is scanned repeatedly with a high energy continuous wave laser in a pattern to create via holes of desired size, shape and depth. This is followed by a short plasma etch. The via holes are produced at commercial production rates under direct computer control without use of masks and without damage to conductor material underlying the dielectric layer. A two-step technique usable to form a large hole to a partial depth in the dielectric layer and several smaller diameter holes within the large hole through the remainder of the dielectric layer depth allows formation of a large number of holes in a given area of a thick dielectric layer.
REFERENCES:
patent: 4617085 (1986-10-01), Cole, Jr. et al.
patent: 4714516 (1987-12-01), Eichelberger et al.
patent: 4764485 (1988-08-01), Loughran et al.
patent: 4780177 (1988-10-01), Wojnarowski et al.
H. S. Cole et al., Laser Processing for Interconnect Technology, SPIE vol. 877 Micro-Optoelectronic Materials (1988), pp. 92-96.
Eichelberger Charles W.
Welles II Kenneth B.
Wojnarowski Robert J.
Davis Jr. James C.
General Electric Company
Powell William A.
Snyder Marvin
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