Laser beam scanning method for forming via holes in polymer mate

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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134 1, 156644, 156651, 156655, 156668, 156345, 20419236, 21912169, 21912185, B44C 122, B29C 3700, C03C 1500, C03C 2506

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048941158

ABSTRACT:
The surface of a polymer dielectric layer is scanned repeatedly with a high energy continuous wave laser in a pattern to create via holes of desired size, shape and depth. This is followed by a short plasma etch. The via holes are produced at commercial production rates under direct computer control without use of masks and without damage to conductor material underlying the dielectric layer. A two-step technique usable to form a large hole to a partial depth in the dielectric layer and several smaller diameter holes within the large hole through the remainder of the dielectric layer depth allows formation of a large number of holes in a given area of a thick dielectric layer.

REFERENCES:
patent: 4617085 (1986-10-01), Cole, Jr. et al.
patent: 4714516 (1987-12-01), Eichelberger et al.
patent: 4764485 (1988-08-01), Loughran et al.
patent: 4780177 (1988-10-01), Wojnarowski et al.
H. S. Cole et al., Laser Processing for Interconnect Technology, SPIE vol. 877 Micro-Optoelectronic Materials (1988), pp. 92-96.

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