Laser beam irradiating apparatus, laser beam irradiating...

Details Laser beam irradiating apparatus, laser beam irradiating... Laser beam irradiating apparatus, laser beam irradiating...

2005-04-06

2008-11-04

Booth, Richard A. (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C257SE21561

Reexamination Certificate

active

07445974

ABSTRACT:
A laser beam irradiating apparatus comprising, a plurality of lasers, member for synthesizing a plurality of laser beams emitted respectively from the plurality of lasers into a single laser beam on a stage, and member for moving the synthesized laser beam on the stage while keeping a specific shape thereof. A semiconductor film can be crystallized or an impurity element doped therein can be activated by irradiating a laser beam to the semiconductor film from the laser beam irradiating apparatus arranged as above. Consequently, it is possible to provide a laser beam irradiating apparatus capable of achieving uniform annealing efficiently by employing an optical system simpler than a conventional one and using laser beams having attenuated regions. Also, it is possible to provide a method of irradiating a laser beam using the laser beam irradiating apparatus, and to provide a method of manufacturing a semiconductor device including the laser beam irradiating method in the fabrication sequence thereof.

REFERENCES:
patent: 4330363 (1982-05-01), Biegesen et al.
patent: 4370175 (1983-01-01), Levatter
patent: 4566043 (1986-01-01), Tamura
patent: 4668089 (1987-05-01), Oshida et al.
patent: 4715318 (1987-12-01), Kameyama et al.
patent: 4978970 (1990-12-01), Okazaki
patent: 5558788 (1996-09-01), Mashburn
patent: 5643826 (1997-07-01), Ohtani et al.
patent: 5803965 (1998-09-01), Yoon
patent: 5854803 (1998-12-01), Yamazaki et al.
patent: 5869803 (1999-02-01), Noguchi et al.
patent: 5886320 (1999-03-01), Gallo et al.
patent: 5923962 (1999-07-01), Ohtani et al.
patent: 5953597 (1999-09-01), Kusumoto et al.
patent: 6043453 (2000-03-01), Arai
patent: 6204099 (2001-03-01), Kusumoto et al.
patent: 6210996 (2001-04-01), Yamazaki et al.
patent: 6265745 (2001-07-01), Kusumoto et al.
patent: 6285042 (2001-09-01), Ohtani et al.
patent: 6335541 (2002-01-01), Ohtani et al.
patent: 6365933 (2002-04-01), Yamazaki et al.
patent: 6396616 (2002-05-01), Fitzer et al.
patent: 6468842 (2002-10-01), Yamazaki et al.
patent: 6506635 (2003-01-01), Yamazaki et al.
patent: 6567219 (2003-05-01), Tanaka
patent: 6573162 (2003-06-01), Tanaka et al.
patent: 6590230 (2003-07-01), Yamazaki et al.
patent: 6650480 (2003-11-01), Tanaka
patent: 6700096 (2004-03-01), Yamazaki et al.
patent: 6849482 (2005-02-01), Yamazaki et al.
patent: 6849825 (2005-02-01), Tanaka
patent: 2001/0019861 (2001-09-01), Yamazaki et al.
patent: 2002/0094008 (2002-07-01), Tanaka
patent: 2002/0100937 (2002-08-01), Yamazaki et al.
patent: 2003/0089691 (2003-05-01), Tanaka
patent: 2003/0112322 (2003-06-01), Tanaka
patent: 2005/0092998 (2005-05-01), Yamazaki et al.
patent: 2005/0111339 (2005-05-01), Tanaka
patent: 0 827 196 (1998-03-01), None
patent: 56-067277 (1981-06-01), None
patent: 61-239619 (1986-10-01), None
patent: 62-104117 (1987-05-01), None
patent: 62-259437 (1987-11-01), None
patent: 01-146319 (1989-06-01), None
patent: 02-056932 (1990-02-01), None
patent: 02-181419 (1990-07-01), None
patent: 03-085729 (1991-04-01), None
patent: 03-232223 (1991-10-01), None
patent: 04-282869 (1992-10-01), None
patent: 05-226790 (1993-09-01), None
patent: 05-315278 (1993-11-01), None
patent: 06-163401 (1994-06-01), None
patent: 07-041845 (1995-02-01), None
patent: 07-326769 (1995-12-01), None
patent: 08-078329 (1996-03-01), None
patent: 08-213629 (1996-08-01), None
patent: 09-270393 (1997-10-01), None
patent: 10-135343 (1998-05-01), None
patent: 11-125839 (1999-05-01), None
patent: 11-145087 (1999-05-01), None
patent: 11-340160 (1999-12-01), None
patent: 2000-299470 (2000-10-01), None
patent: 3221724 (2001-10-01), None
patent: 2001127004 (2001-11-01), None
patent: 2003-243321 (2003-08-01), None
Hara et al.,Ultra-High Performance Poly-Si TFTs on a Glass by a Stable Scanning CW Laser Lateral Crystallization, AM-LCD '01, pp. 227-230.
Takeuchi et al.,Performance of Poly-Si TFTs Fabricated by a Stable Scanning CW Laser Crystallization, AM-LCD '01, pp. 251-254.

Affiliated with

Also associated with

Rating

Laser beam irradiating apparatus, laser beam irradiating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser beam irradiating apparatus, laser beam irradiating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser beam irradiating apparatus, laser beam irradiating... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4039483