Laser assisted nano deposition

Details Laser assisted nano deposition Laser assisted nano deposition

2005-07-26

2008-09-02

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

On insulating substrate or layer

C438S478000, C438S485000, C438S487000, C438S535000, C257SE23095, C977S700000, C977S712000, C977S773000, C977S786000

Reexamination Certificate

active

07419887

ABSTRACT:
An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto the deposited nano particles on the substrate. The apparatus and method is suitable for fabricating patterned conductors, semiconductors and insulators on semiconductor wafers of a nano scale line width by direct nanoscale deposition of materials.

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