Laser-assisted liquid-phase etching of copper conductors

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156656, 156666, 156345, 156902, 21912169, 21912185, 252 792, 252 794, C23F 102, B44C 122, C03C 1500, C03C 2506

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049043404

ABSTRACT:
A process for laser-assisted liquid phase etching of copper conductors which includes the use of a solution of sulfuric acid and hydrogen peroxide in contact with an integrated circuit substrate and the provision of a laser beam to select substrate areas having copper conductors to be etched. Also disclosed is an apparatus for the laser-assisted etching.

REFERENCES:
patent: 3412032 (1968-11-01), Jenks
patent: 4283259 (1981-08-01), Melcher et al.
patent: 4395302 (1983-07-01), Courduvelis
patent: 4401509 (1983-08-01), Schellinger
patent: 4518456 (1985-05-01), Bjorkholm
Gutfeld, "Laser-Enhanced Plating and Etching for Microelectronic Applications", IEEE Circuits and Devices Magazine, Jan. 1986, pp. 57-60.
Silversmith, "Laser Direct Write Technologies as Tools for Gate-Array Development", Mat. Res. Soc. Symp. Proc., vol. 29, 1984, pp. 55-59.
J. Tsao, "Laser-Controlled Wet Chemical Etching for Corrective Trimming of Thin Films", J. Electrochem. Soc., vol. 133, No. 11, Nov. 1986, pp. 2244-2248.
Tuckerman, "Laser-Patterned Interconnect for Thin-Film Hybrid Water-Scale Circuits", IEEE Electron Device Letters, vol. EDL-8, No. 11, Nov. 1987, pp. 540-543.
Jensen, "Copper-Polyimide Materials System for High Performance Packaging", IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. CHMT-7, No. 4, Dec. 1984, pp. 384-393.
Hart, "Bright Dipping and Etching of Copper-Based Materials in Solutions of Sulphyric Acid and Hydrogen Peroxide, Trans. Inst. Metal Finishing", vol. 61, 1983, pp. 46-49.
Luke, "Etching of Copper with Sulphuric Acid/Hydrogen Peroxide Solutions", Trans. Inst. Metal Finishing, vol. 62(3), 1984, pp. 81-82.

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