Laser apparatus, laser annealing method, and manufacturing...

Details Laser apparatus, laser annealing method, and manufacturing... Laser apparatus, laser annealing method, and manufacturing...

2005-12-13

2005-12-13

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S487000, C438S795000

Reexamination Certificate

active

06974731

ABSTRACT:
To provide a laser apparatus and a laser annealing method with which a crystalline semiconductor film with a larger crystal grain size is obtained and which are low in their running cost. A solid state laser easy to maintenance and high in durability is used as a laser, and laser light emitted therefrom is linearized to increase the throughput and to reduce the production cost as a whole. Further, both the front side and the back side of an amorphous semiconductor film is irradiated with such laser light to obtain the crystalline semiconductor film with a larger crystal grain size.

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