Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate
2011-03-15
2011-03-15
Garber, Charles D (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
Insulated gate formation
C438S486000, C438S648000
Reexamination Certificate
active
07906419
ABSTRACT:
A laser annealing method for manufacturing a semiconductor device is presented. The method includes at least two forming steps and one annealing step. The first forming steps includes forming gates on a semiconductor substrate. The second forming step includes forming an insulation layer on the semiconductor substrate and on the gates. The annealing step includes annealing the insulation layer using electromagnetic radiation emitted from a laser.
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Cho Ho Jin
Kim Jae Soo
Park Cheol Hwan
Garber Charles D
Hynix / Semiconductor Inc.
Isaac Stanetta D
Ladas & Parry LLP
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