Laser annealing method and laser annealing device

Details Laser annealing method and laser annealing device Laser annealing method and laser annealing device

2007-09-18

2007-09-18

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C117S008000, C134S001300

Reexamination Certificate

active

10921872

ABSTRACT:
In order to promote an effect of laser annealing in respect of a semiconductor film, moisture is intentionally included in an atmosphere in irradiating laser beam to the semiconductor film by which a temperature holding layer comprising water vapor is formed on the surface of the semiconductor film in irradiating the laser beam and the laser annealing operation can be performed effectively.

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