Large-sized glass substrate

Details Large-sized glass substrate Large-sized glass substrate

2007-02-12

2010-06-29

Lopez, Carlos (Department: 1791)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S426000

Reexamination Certificate

active

07745071

ABSTRACT:
A large-sized substrate having a diagonal length of not less than 500 mm and a ratio of flatness/diagonal length of not more than 6×10−6is disclosed. By use of the large-sized substrate for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the CD accuracy (dimensional accuracy) at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape.

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Abstract JP63-172158,Jul. 1988, 1 page.
Machine Translation of JP 2000-016823, Jan. 2000, 6 pages.

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