Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Reexamination Certificate
2005-03-15
2005-03-15
Deo, Duy-Vu N. (Department: 1765)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
C117S224000, C117S900000
Reexamination Certificate
active
06866714
ABSTRACT:
A large semiconductor crystal has a diameter of at least 6 inches and a low dislocation density of not more than 1×104cm−2. The crystal is preferably a single crystal of GaAs, or one of CdTe, InAs, GaSb, Si or Ge, and may have a positive boron concentration of not more than 1×1016cm−3and a carbon concentration of 0.5×1015cm−3to 1.5×1015cm−3with a uniform concentration throughout the crystal. Such a crystal can form a very thin wafer with a low dislocation density. A special method and apparatus for producing such a crystal is also disclosed.
REFERENCES:
patent: 3615878 (1971-10-01), Chang
patent: 4404172 (1983-09-01), Gault
patent: 4609530 (1986-09-01), Morioka et al.
patent: 4704257 (1987-11-01), Tomizawa et al.
patent: 5057287 (1991-10-01), Swiggard
patent: 5074953 (1991-12-01), Shirata et al.
patent: 5096677 (1992-03-01), Katsuoka et al.
patent: 5132145 (1992-07-01), Valentian
patent: 5196173 (1993-03-01), Arai et al.
patent: 5210052 (1993-05-01), Takasaki
patent: 5256381 (1993-10-01), Tada et al.
patent: 5290395 (1994-03-01), Matsumoto et al.
patent: 5566433 (1996-10-01), Love et al.
patent: 5685907 (1997-11-01), Fujikawa et al.
patent: 6254677 (2001-07-01), Hashio et al.
patent: 6693021 (2004-02-01), Motoki et al.
patent: 2142388 (1972-06-01), None
patent: 0290322 (1968-11-01), None
patent: 0559921 (1993-09-01), None
patent: 2535312 (1964-05-01), None
patent: 2205087 (1988-11-01), None
patent: 2130192 (1994-05-01), None
patent: 55140792 (1980-04-01), None
patent: 02018375 (1990-01-01), None
patent: 2120292 (1990-05-01), None
patent: 02233578 (1990-09-01), None
patent: 07221038 (1995-08-01), None
Kawase et al. “Low Dislocation Density 6-Inch Diametar GaAs single Crystals Grown By the VCZ Method”, Gallium Arsenide and Related Compounds, Karuizawa, Sep. 28-Oct. 2, 1992, No. SYMP, 19, Sep. 28, 1992, pp. 13-18.
Kuma et al. “Growth and Characterization of Huge GaAs Crystals”, Gallium Arsenide and Related Compounds, Freiburg, Aug. 29-Sep. 2, 1993, No. SYMP. 20, 29 Aug., 1993, pp. 497-504.
“Growth and Characterization of Single Crystels of PbTe-SnTe”, by John W. Wagner et al., Transactions of the Metallurgical Society of AIME, vol. 242, (1968), pp. 366-371.
“Effect of Ultrasonic Vibrations on InSb Pulled Crystals”, by Yasuhiro Hayakawa et al., Japanese Journal of Applied Physics, vol. 21, No. 9 (1982), pp. 1273-1277.
“Melt-Growth of III-V Compounds by the Liquid Encapsulation and Horizontal Growth Techniques”; by J.B. Mullin; III-V Semiconductor Materials and Devices, Elsevier Science Publishers B.V.,1989, pp. 10 to 12.
1995 Tohoku University, Master's Thesis (Yuta Hino), “Distribution Equilibrium of Oxygen Between Molten Group III Metal and B2O3Flux”, Fig. 3-1.
Hashio Katsushi
Kawase Tomohiro
Sawada Shin-ichi
Tatsumi Masami
Deo Duy-Vu N.
Fasse W. F.
Fasse W. G.
Sumitomo Electric Industries Ltd.
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