Large-scale, low pressure plasma-ion deposition of diamondlike c

Details Large-scale, low pressure plasma-ion deposition of diamondlike c Large-scale, low pressure plasma-ion deposition of diamondlike c

1995-10-12

1998-01-27

Gorgos, Kathryn L.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427577, 427122, 427249, B05D 306

Patent

active

057120005

ABSTRACT:
Diamondlike carbon is deposited on a deposition substrate in a deposition apparatus that can be evacuated and backfilled with a carbonaceous gas. A plasma is generated in the gas by heating a filament within the chamber to produce electrons, and positively biasing the filament with respect to the deposition chamber wall to accelerate the electrons into the carbonaceous gas. The carbonaceous gas dissociates and ionizes in the resulting plasma to produce positively charged carbon ions. A deposition substrate within the chamber is negatively biased with respect to the deposition chamber wall, accelerating the carbon ions so that they are deposited onto the surface of the substrate.

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