Large area plasma source

Details Large area plasma source Large area plasma source

2008-07-15

2008-07-15

Tran, Thuy Vinh (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C156S345360, C204S298380

Reexamination Certificate

active

10894225

ABSTRACT:
An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.

REFERENCES:
patent: 5079481 (1992-01-01), Moslehi
patent: 5133825 (1992-07-01), Hakamata et al.
patent: 5308417 (1994-05-01), Groechel et al.
patent: 5534231 (1996-07-01), Savas
patent: 5620522 (1997-04-01), Ichimura et al.
patent: 5762814 (1998-06-01), Ohara et al.
patent: 5975014 (1999-11-01), Dandl
patent: 6084356 (2000-07-01), Seki et al.
patent: 6350347 (2002-02-01), Ishii et al.
patent: 6380684 (2002-04-01), Li et al.
patent: 6390019 (2002-05-01), Grimbergen et al.
patent: 6504159 (2003-01-01), Keller
patent: 6551445 (2003-04-01), Yokogawa et al.
patent: 6551447 (2003-04-01), Savas et al.
patent: 6632324 (2003-10-01), Chan
patent: 6805770 (2004-10-01), Oster
patent: 6922019 (2005-07-01), Leung et al.
patent: 7316199 (2008-01-01), Horioka et al.
patent: 2001/0001185 (2001-05-01), Setoyama et al.
patent: 2001/0008171 (2001-07-01), Fukuda et al.
patent: 2003/0006708 (2003-01-01), Leung et al.
patent: 2003/0150562 (2003-08-01), Quon

Affiliated with

Also associated with

Rating

Large area plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Large area plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Large area plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3921527