Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2008-07-15
2008-07-15
Tran, Thuy Vinh (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C156S345360, C204S298380
Reexamination Certificate
active
07400096
ABSTRACT:
An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.
REFERENCES:
patent: 5079481 (1992-01-01), Moslehi
patent: 5133825 (1992-07-01), Hakamata et al.
patent: 5308417 (1994-05-01), Groechel et al.
patent: 5534231 (1996-07-01), Savas
patent: 5620522 (1997-04-01), Ichimura et al.
patent: 5762814 (1998-06-01), Ohara et al.
patent: 5975014 (1999-11-01), Dandl
patent: 6084356 (2000-07-01), Seki et al.
patent: 6350347 (2002-02-01), Ishii et al.
patent: 6380684 (2002-04-01), Li et al.
patent: 6390019 (2002-05-01), Grimbergen et al.
patent: 6504159 (2003-01-01), Keller
patent: 6551445 (2003-04-01), Yokogawa et al.
patent: 6551447 (2003-04-01), Savas et al.
patent: 6632324 (2003-10-01), Chan
patent: 6805770 (2004-10-01), Oster
patent: 6922019 (2005-07-01), Leung et al.
patent: 7316199 (2008-01-01), Horioka et al.
patent: 2001/0001185 (2001-05-01), Setoyama et al.
patent: 2001/0008171 (2001-07-01), Fukuda et al.
patent: 2003/0006708 (2003-01-01), Leung et al.
patent: 2003/0150562 (2003-08-01), Quon
Foster John
Patterson Michael
Cohn Howard M
Le Tung X
The United States of America as represented by the Administrator
Tran Thuy Vinh
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