Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-06-07
2011-06-07
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S005000, C430S270100, C430S273100, C430S319000, C430S322000, C430S330000, C430S331000
Reexamination Certificate
active
07955783
ABSTRACT:
A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way of the adhesive state of the photosensitive material or by way of an adhesive applied to the photosensitive material or the thin film or carried by the thin film. Digital mask printing may proceed on the surface of the thin film. The photosensitive material may then be exposed through the printed photomask, the thin film (with photomask) removed, and the photosensitive material developed.
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Crawford Clark
Limb Scott
Shrader Eric
Srinivasan Uma
Palo Alto Research Center Incorporated
Small Jonathan A.
Walke Amanda C.
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