Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-08-16
1995-11-07
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 50, 118 59, 118 68, 118 69, 118723E, 427249, 4272552, 4272555, 427294, 427299, 4273982, 427574, B05D 306
Patent
active
054646677
ABSTRACT:
A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.
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Follett Gary J.
Kirk Seth M.
Kohler Gunter A.
Griswold Gary L.
Kirn Walter N.
Minnesota Mining and Manufacturing Company
Pianalto Bernard
Truesdale Carole
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