Isolation of novolak resin without high temperature distillation

Details Isolation of novolak resin without high temperature distillation Isolation of novolak resin without high temperature distillation

1997-09-29

1999-01-26

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430168, 430169, 430192, G03C 500

Patent

active

058637001

ABSTRACT:
The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin without high temperature distillation. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.

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Chemistry and Application of Phenolic Resins, Chapter 4, Knap & W. Scheib Light Sensitive Systems, Chapter 7.4, J. Kosar.
"Rearrangement of Novolak Resins", Rahman et al, SPIE vol. 2195, pp. 685-706.
"Nature and degree of Substitution Patterns in Novolaks by Carbon-13 NMR Spectoscopy" Khadim et al SPIE vol. 1672, pp. 347-359, Mar. 1992.
"The Effect of Lewis Bases on the Molecular Weight of Novolak Resins" Rahman et al.

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