Isolation of novolak resin by low temperature sub surface forced

Details Isolation of novolak resin by low temperature sub surface forced Isolation of novolak resin by low temperature sub surface forced

1998-04-02

2000-12-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

528155, 528165, G03C 500

Patent

active

061656755

ABSTRACT:
A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.

REFERENCES:
patent: 5374693 (1994-12-01), Lynch, et al.
patent: 5403696 (1995-04-01), Hioki et al.
patent: 5407780 (1995-04-01), Hioki et al.

Affiliated with

Also associated with

Rating

Isolation of novolak resin by low temperature sub surface forced does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Isolation of novolak resin by low temperature sub surface forced, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Isolation of novolak resin by low temperature sub surface forced will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-992827