Irradiation pattern data generation method, mask fabrication...

Details Irradiation pattern data generation method, mask fabrication... Irradiation pattern data generation method, mask fabrication...

2007-10-03

2010-10-05

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07810066

ABSTRACT:
An irradiation pattern data generation method includes: a process for providing a design pattern having diagonal side portions that extend diagonally with respect to an X-axis direction and a Y-axis direction on an XY plane; a rectangular approximation process for approximating the design pattern to rectangles to generate a rectangular approximation pattern; a first correction process for shifting the side portions of the rectangular approximation pattern in the Y-axis direction to generate a first correction pattern; and a second correction process for enlarging the side portions of the first correction pattern in the X-axis direction and the Y-axis direction to generate an irradiation pattern.

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