Irradiation cross-linkable thermostable polymer system, for micr

Details Irradiation cross-linkable thermostable polymer system, for micr Irradiation cross-linkable thermostable polymer system, for micr

1985-08-05

1988-03-22

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430315, 430277, 430275, 430324, 430325, 430330, 430286, 522 97, 522181, 522168, 522182, 522100, 526246, 526245, 526270, 525922, G03C 500

Patent

active

047328436

ABSTRACT:
Linear fluorooligomers having at least two reactive end groups per polymer molecule are incorporated into radiation sensitive polymer systems which have improved continuous temperature resistance and low dielectric constant. The polymer systems can be applied as lacquers. Preferably perfluorated poly-ethers and perfluorated alkanes are used as starting compounds. The polymeric product is usable as a coating for the production of printed multi-layer wirings and economises on through-bores and additional copper intermeidate layers. A further field of application exists in the field of integrated semiconductor ciruits in VLSI-technology for the production of negative photo-resists.

REFERENCES:
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patent: 4321404 (1982-03-01), Williams
patent: 4504567 (1985-03-01), Yamamoto et al.
Hartmut, Steppan et al, "The Resist Technique-A Chemical Contribution to Electronics", Angewandte Chemie Int. Engl., vol. 21, No. 7, 1982, pp. 455-469.
Article by A. Ledwith in "IEEE Proceedings", vol. 130, Part 1, No. 5, Oct. 1983, on pp. 245 to 251.

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