Iridium oxide film for electrochromic device

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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20429813, 252518, 423 22, 420461, C23C 1408, C23C 1434, H01B 108

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active

056183909

ABSTRACT:
A method of depositing a nitrogen-containing electrochromic iridium oxide film by sputtering iridium in an atmosphere comprising oxygen and nitrogen is disclosed for use in producing a transparent electrochromic article. The article includes electroconductive films, e.g., ITO, on two substrates, one of which has a superimposed electrochromic film, e.g., tungsten oxide, and the other of which has superimposed the iridium oxide film of the invention. An ion conductive layer between the electrochromic films completes the article.

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