Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-02-16
1997-04-08
Lieberman, Paul
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429813, 252518, 423 22, 420461, C23C 1408, C23C 1434, H01B 108
Patent
active
056183909
ABSTRACT:
A method of depositing a nitrogen-containing electrochromic iridium oxide film by sputtering iridium in an atmosphere comprising oxygen and nitrogen is disclosed for use in producing a transparent electrochromic article. The article includes electroconductive films, e.g., ITO, on two substrates, one of which has a superimposed electrochromic film, e.g., tungsten oxide, and the other of which has superimposed the iridium oxide film of the invention. An ion conductive layer between the electrochromic films completes the article.
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Backfisch David L.
Hichwa Bryant P.
O'Brien Nada A.
Yu Phillip C.
Kopec M.
Lieberman Paul
PPG Industries Inc.
Stein Irwin M.
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