Ionic, organic photoacid generators for DUV, MUV and optical...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C430S313000, C558S427000, C558S432000, C570S183000, C570S187000

Reexamination Certificate

active

07655379

ABSTRACT:
A photoacid generator compound P+A−, comprises an antenna group P+comprising a cation that generates protons upon interaction with light, and A−comprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7,wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. P+comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P+may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.

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