Ion treatment apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

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2504922, G01N 2100, G01N 2300

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active

045146365

ABSTRACT:
A method and apparatus are disclosed for providing heat conduction between an article being treated in a vacuum and a support member by providing a gas under pressure of about 0.5 to 2.0 Torr between the article and the support member. The method and apparatus are described for use in a semiconductor wafer ion implantation system wherein the wafer is clamped to the support member which is cooled. A seal can be provided between the wafer and the support member adjacent the periphery of the article.

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