Ion source with uniformity of radial distribution of ion...

Details Ion source with uniformity of radial distribution of ion... Ion source with uniformity of radial distribution of ion...

2008-01-22

2008-01-22

Tran, Thuy Vinh (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111810, C250S42300F

Reexamination Certificate

active

07321198

ABSTRACT:
An ion source, comprising: a discharge chamber, in which is formed an opening; a coil, provided outside said discharge chamber, for generating plasma within said discharge chamber; an extraction electrode, which extracts ions in said plasma generated in said discharge chamber from said opening and generates an ion beam; a power supply device, which supplies power to said coil; and a control device, which can repeatedly halt output power output from said power supply device over prescribed intervals, while maintaining a value of said output power at a value, set in advance, which renders radial direction distribution of ion beam intensity of said ion beam uniform.

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patent: 7196337 (2007-03-01), Mikolas
patent: A-9-148264 (1997-06-01), None
patent: A-11-162867 (1999-06-01), None
patent: A-2003-323999 (2003-11-01), None
patent: A 2004-039459 (2004-02-01), None

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