Ion plasma electron gun with dose rate control via amplitude mod

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

31511191, 31511131, 31511181, 250423R, H02K 3900

Patent

active

047499117

ABSTRACT:
An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

REFERENCES:
patent: 2738439 (1956-03-01), Hornbuckle
patent: 3010017 (1961-11-01), Brubaker et al.
patent: 3243570 (1966-03-01), Boring
patent: 3411035 (1968-11-01), Necker
patent: 3866089 (1975-02-01), Hengartner
patent: 3903891 (1975-09-01), Brayshaw
patent: 3970892 (1976-07-01), Wakalopulos
patent: 4061944 (1977-12-01), Gay
patent: 4288716 (1981-09-01), Hinkel et al.
patent: 4298817 (1981-11-01), Carette et al.
patent: 4359667 (1982-11-01), Paterson et al.
patent: 4453078 (1984-06-01), Shimizu
patent: 4574179 (1986-03-01), Masuzawa et al.
patent: 4598231 (1986-07-01), Matsuda et al.
patent: 4628227 (1986-12-01), Briere
patent: 4645978 (1987-02-01), Harvey et al.
patent: 4684848 (1987-08-01), Kaufman et al.
patent: 4694222 (1987-09-01), Wakalopulos
Zakharchenko et al., "A Stabilization Unit For A Cold Cathode Glow Discharge Electron-Beam Gun", Art. Svarka, vol. 28, No. 12, pp. 56-58, (Dec. 1975).
Bayless et al., "The Plasma-Cathode Electron Gun", IEEE Journal Quantum Electronics, vol. QE-10, No. 2, pp. 213-218, (Feb. 1974).
Wakalopulos et al., "Wire-Ion-Plasma (WIP): A Revolutionary New Technology For E-Beam Curing", Society of Manufacturing Engineers, technical paper, pp. 1-17, (1983).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion plasma electron gun with dose rate control via amplitude mod does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion plasma electron gun with dose rate control via amplitude mod, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion plasma electron gun with dose rate control via amplitude mod will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-846377

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.