Ion implanting apparatus

Details Ion implanting apparatus Ion implanting apparatus

1988-06-13

1990-04-03

Anderson, Bruce C.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

2504922, H05H 300

Patent

active

049142925

ABSTRACT:
In an ion implanting apparatus equipped with an electron shower for neutralizing the positive charge-up by the ion implantation with electrons, an electrically conductive tube is disposed just before the workpiece to be ion-implanted to pass through an ion beam which has a diameter nearly equal to the inner hollow channel of the tube section to absorb those electrons which do not overlap the positive ion beam, and a flange section extends substantially parallel to the surface of the workpiece to absorb the secondary electrons emitted from the ion implant portion thereby suppressing the negative change-up around the ion implanted portion.

REFERENCES:
patent: 3363124 (1968-01-01), Bensussam et al.
patent: 3676672 (1972-07-01), Meckel
patent: 4361762 (1982-11-01), Douglas
patent: 4463255 (1984-07-01), Robertson et al.
patent: 4783597 (1988-11-01), Misawa et al.
Catalog, Sumitomo Eaton Nova, NV-10SD corres. to NV-10-80 and 160 of Eaton, Sen.
Literature, Model 80-10 of Varian, pp. 1-12.
Japanese Catalog, Model 80-10/120-10/160-10 Varian.
Japanese Catalog, Model 80XP/120XP/160XP of Varian.
Literature, Precision Implant 9000 of AMT.

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