Ion implanters

Details Ion implanters Ion implanters

2007-10-24

2010-11-23

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S3960ML

Reexamination Certificate

active

07838849

ABSTRACT:
The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion beam. The present invention sees the use of surfaces that are formed so as to present a series of angled faces that meet at sharp intersections. In this way, any material will be sputtered away from the ion beam.

REFERENCES:
patent: 4560879 (1985-12-01), Wu et al.
patent: 4587432 (1986-05-01), Aitken
patent: 4754200 (1988-06-01), Plumb et al.
patent: 2007/0102652 (2007-05-01), Ring et al.
patent: 2008/0164427 (2008-07-01), Collart et al.
patent: 2009/0166565 (2009-07-01), Alcott et al.
patent: 2007258154 (2007-10-01), None

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