Ion implanter optimizer scan waveform retention and recovery

Details Ion implanter optimizer scan waveform retention and recovery Ion implanter optimizer scan waveform retention and recovery

2001-09-12

2009-06-16

Padgett, Marianne L (Department: 1792)

Coating processes

Measuring, testing, or indicating

C427S523000, C250S3960ML, C250S397000, C250S492210, C250S492300

Reexamination Certificate

active

07547460

ABSTRACT:
Methods and apparatus are provided for controlling dose uniformity in an ion implantation system. According to one embodiment of the invention, an initial scan waveform is adjusted to obtain a desired uniformity for use in a first implant process, and the adjusted scan waveform is stored. The stored scan waveform is recalled and used in a second implant process. According to a another embodiment of the invention, desired beam parameters are identified and, based on the desired beam parameters, a stored scan waveform is recalled for use in a uniformity adjustment process, and the uniformity adjustment process is performed. According to a further embodiment of the invention, an apparatus is provided that includes a beam profiler for measuring a current distribution of a scanned ion beam. The apparatus also includes a data acquisition and analysis unit for adjusting an initial scan waveform based on a desired current distribution and the measured current distribution for use in a first implant process, storing the adjusted scan waveform, recalling the stored scan waveform, and using the recalled scan waveform in a second implant process.

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