Ion implanter and a method of implanting ions

Details Ion implanter and a method of implanting ions Ion implanter and a method of implanting ions

2005-06-07

2005-06-07

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S3960ML

Reexamination Certificate

active

06903349

ABSTRACT:
An ion implanter incorporates an r.f. accelerator assembly to provide ions for implant at high energies. The accelerator assembly includes electrodes mounted in the vacuum chamber so as to be movable between an operational position for generating and accelerating electric field and a non operational position within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position and for low energy implants the actuator moves the electrodes to the non operational position clear of the beam path.

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A.D. Vlasov,Theory of Linear Accelerators, Chapter 2.5, published in English, translated 1968.
H.F. Glavish et al., “Production High Energy Implanters Using Radio Frequency Acceleration” in Nuclear Instruments and Methods in Physics Research, B21 (1987), pp. 264-269.

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