Ion implanter

Details Ion implanter Ion implanter

1992-01-27

1993-06-08

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

25044211, 269238, G21K 510

Patent

active

052182096

ABSTRACT:
An ion implanter for implanting ions into a batch of semiconductor wafers comprises a wafer holding disk of the centrifugal holding type, and a plurality of wafer rests in the wafer holding disk having a wafer holding surface which is conically curved. When the wafer holding disk is rotated, the wafer is pushed onto the wafer holding surface so that the surface of the wafer is curved nearly in the same manner as the conically-curved inner surface of the peripheral portion of the s wafer holding disk As a result, an ion beam being irradiated upon the surface of the wafer is always perpendicular to the surface of the wafer.

REFERENCES:
patent: 4817556 (1989-04-01), Mears et al.
patent: 5040484 (1991-08-01), Mears et al.

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