Ion implanter

Details Ion implanter Ion implanter

1998-08-19

2000-07-04

Nguyen, Kiet T.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

H01J 3720

Patent

active

060842407

ABSTRACT:
A temperature monitor is included inside an ion implanting chamber to constantly monitor the wafer temperature during ion implantation. The measured temperature signal is sent to a central control system through an interface circuit. When an abnormal temperature is detected, the central control system automatically ceases the ion implantation operation and triggers an alarm for operators.

REFERENCES:
patent: 4419584 (1983-12-01), Benveniste
patent: 4812663 (1989-03-01), Douglas-Hamilton et al.
patent: 5126571 (1992-06-01), Sakai
patent: 5753923 (1998-05-01), Mera et al.

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